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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

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Scientific Article | Ici, l’accumulation des ions cuivreux dans une solution en une expérience de modèle et d’une analyse fondée sur des mesures
Knowledge of the behavior of cuprous ions (monovalent copper ion: Cu(I)) in a copper sulfate plating bath is important for improving the plating process.

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A novel method of rapid detection for heavy metal copper ion via a specific copper chelator bathocuproinedisulfonic acid disodium salt

Accumulation & Analysis-Cuprous Ions In Copper Sulfate Plating Solution l Protocol Preview

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

A novel method of rapid detection for heavy metal copper ion via a specific copper chelator bathocuproinedisulfonic acid disodium salt

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Figure 6 from Analysis of Cu(I) in Copper Sulfate Electroplating Solution